The legal battle to hold Dow Chemical accountable for the Bhopal gas disaster continues in Bhopal's JMFC court. Despite Dow's ...

This paper reports research performed on developing and optimizing a process recipe for the plasma etching of deep high-aspect ratio features into silicon carbide (SiC) material using an ...

Amazon’s Prime Day 2025 hub is loaded with can’t-miss Makita bargains—from the versatile 12V MAX CXT Multi-Cutter Kit to ...

The design method of nitrogen ion-implanted layer on 4H-SiC p-type epitaxial layer is presented, including the implantation does, energies, channel depth, and barrier layer thickness. The implantation ...

We further show that the defects introduced by ion irradiation can significantly affect the properties of the single-layer MoS 2, leading to considerable changes in its photoluminescence ...