Why is wet etch preferred for thin-film stripping processes?... | Filo
Why is wet etch preferred for thin-film stripping processes?... | Filo
10 months ago
askfilo.com
In semiconductor manufacturing wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic of this process. Two different etching solutions are being evaluated. Eight randomly selected wafers have been etched in each solution and the observed etch rates (in mils/min) are shown below. 2c Solution 1 2c Solution 2 9.9 10.6 10.2 10.6 9.4 10.3 10.0 10.2 10.0 9.3
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